Magnetron sputtering coating o se auala fou e ufiufi ausa faaletino, faʻatusatusa i le auala muamua e faʻafefeteina ai, o ona tulaga lelei i le tele o itu e matua ofoofogia lava.I le avea ai o se tekinolosi matua, ua faʻaaogaina le magnetron sputtering i le tele o vaega.
Fa'atonuga o le fa'aosoina o le Magnetron:
O se fanua maneta orthogonal ma eletise eletise ua faaopoopo i le va o le sputtered taula taulaʻi (cathode) ma le anode, ma le kasa inert manaomia (masani Ar kasa) ua faatumuina i le potu gaogao maualuga.O le maneta tumau e fausia ai le 250-350 gaus maneta i luga o le mea o loʻo faʻamoemoeina, ma o le faʻaogaina o le eletise eletise o loʻo faʻapipiʻiina ma le eletise eletise maualuga.I lalo o le aafiaga o le fanua eletise, Ar kasa ionization i ions lelei ma electrons, taulaʻiga ma o loʻo i ai se mamafa le lelei, mai le taulaʻiga mai le pou e ala i le aafiaga o le mageta maneta galue kasa ionization faatupulaia, fausia se plasma density maualuga latalata i le cathode, Ar ion i lalo o le gaioiga a lorentz malosi, faatelevave e lele i luga o le taulaiga, pomuina luga o le sini i se saoasaoa maualuga, O le sputtered atoms i luga o le taulaiga mulimuli i le mataupu faavae o le liua malosi ma lele ese mai le luga o le sini ma le kinetic maualuga. malosi i le mea fa'apipi'i ata.
Magnetron sputtering e masani ona vaevaeina i ni ituaiga se lua: DC sputtering ma RF sputtering.O le mataupu faavae o le DC sputtering meafaigaluega e faigofie, ma le fua faatatau e vave pe a sputtering uamea.O le faʻaogaina o le RF sputtering e sili atu le lautele, faʻaopoopo i le faʻafefeina o mea faʻatautaia, ae faʻapea foʻi le faʻaogaina o mea e le faʻaogaina, ae faʻapea foʻi ma le faʻaogaina o le faʻaogaina o le oxides, nitrides ma carbide ma isi mea faʻapipiʻi.Afai e fa'atuputeleina le fa'atuputeleina o le RF, e avea ma microwave plasma sputtering.I le taimi nei, e masani ona faʻaaogaina le faʻaogaina o le microwave plasma sputtering (ECR).
Magnetron sputtering coating mea fa'atatau:
u'amea mea fa'atatau manumanu, fa'apipi'i u'amea fa'apipi'i mea fa'apipi'i, mea fa'apipi'i fa'apipi'i sima, mea fa'apipi'i fa'amea fa'atatau, carbide ceramic sputtering mea fa'atatau, fluoride ceramic sputtering mea fa'atatau, nitride ceramic sputtering mea fa'atatau, oxide ceramic target, selenide ceramic mea, sputtering material target. silicide ceramic sputtering mea fa'atatau, sulfide ceramic sputtering target mea, Telluride ceramic sputtering target, isi sima sini, chromium-doped silicon oxide ceramic target (CR-SiO), indium phosphide target (InP), lead arsenide target (PbAs), indium arsenide sini (InAs).
Taimi meli: Au-03-2022